Dual high-voltage power supply for ion implanter applications

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HiTek Power has introduced a dual 5kV/60kV rack-mounted power supply for ion implantation applications. This approach keeps costs low while meeting the demanding requirements of ion implanter manufacturers in the US and Japan. The 5kV section is intended


HITEK POWER


HiTek Power has introduced a dual 5kV/60kV rack-mounted power supply for ion implantation applications. This approach keeps costs low while meeting the demanding requirements of ion implanter manufacturers in the US and Japan. The 5kV section is intended for shallow implants and the 60kV section is intended for deeper implants. The system offers superior ripple and noise performance at output levels below 5kV together with a full range of remote monitoring and control functions.



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