Intel has signed an agreement to provide Cymer, Inc with $20 million in funding over the next three years to accelerate the development of production-worthy extreme ultraviolet (EUV) lithography light sources.
According to Cymer, EUV lithography is set for commercial deployment in 2009 but several issues must be addressed to keep the technology on track.
A key issue is the ability to increase source output power to meet the wafer throughput requirements of high volume manufacturing, while minimising the cost of ownership for EUV lithography tools.
‘Accelerating EUV technology development to enable its successful implementation in high volume manufacturing for the 32nm node in 2009 is a critical mission at Intel,’ said Peter Silverman, Intel Fellow and director of Intel’s Lithography Capital Equipment Development.
‘This agreement will further enable Intel and Cymer to concentrate on the critical technology challenges and on delivering a cost-effective, commercial EUV source solution to produce development tools in 2006 and meet the industry’s 2009 production timeline,’ added Silverman.
Further details of the agreement were not disclosed.