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Renishaw has introduced its Modus CMM software application built on the Metris Camio CMM software, enabling it to offer CMM users a complete retrofit upgrade.

In a recent agreement with Metris, Renishaw acquired a license to the Camio source code.

Renishaw has also recruited a team of engineers from Metris to support the future development of its Modus software.

Modus features a configurable user interface allowing native DMIS programs to be developed offline.

Programs can be created directly from CAD with on-screen probe path verification.

The CMM environment, the fixture and the location of the part on the machine can all be defined, enabling full motion simulation and crash detection including five-axis moves.

This minimises CMM downtime as programs arrive at the machine ready to run, with little or no prove-out time required.

Modus offers a wide array of programming, measurement, and reporting functionality but, in recognition of the fact that the majority of users use only a subset of the user interface, both the layout and the content can be tailored to suit individual users.

Toolbars are fully configurable to ensure only the buttons required are shown and that they are positioned exactly where required.

Context-sensitive graphical user instructions support programs in several different ways: keyboard entry, ‘teach’ from the joystick control or direct from CAD model data.

The program editor supports true native DMIS.

It features high-level programming commands including variable declaration, logic, macros, intrinsic functions and operator prompts via user-definable dialogue boxes.

Automated error recovery during program execution is also available.

In addition to the neutral formats of IGES, STEP, Parasolid and VDAFS, Modus features integration with CATIA (V5 and V4), Siemens NX (previously Unigraphics), Pro/E and Solidworks CAD/CAM solutions.

The software also includes healing and simplification technology to optimise CAD models.

Users can select feature geometries and nominal dimensions from one or more imported CAD models, and compare measured data to CAD nominals.

Product manufacturing information (PMI) may also be accessed from CATIA V5, Pro/E and NX models, enabling the use of embedded dimensional and tolerance information, which is accessed using the Modus planning solution module.

Feature labels are maintained throughout the workflow from CAD to inspection report.

Modus makes full use of Camio’s wide range of feature measurement and construction routines.

Features include circles, lines, planes, points, cones, curves and surfaces, plus relative measurement of thin-walled parts.

There is also support for the construction of features, including intersections and projections.

Part location and orientation techniques range from simple 3-2-1 methods to complex free form and iterative alignments.

Certified feature fitting algorithms include least squares, minimum circumscribed, maximum inscribed and max/min.

Filtering of scanned data is also supported for geometric features.

The reporting capability of Modus includes traditional CMM text reports with user-defined formatting.

Graphical reporting enables results to be displayed against the CAD model, including whisker charts or 3D form plotting for many features.

Building on a foundation of industry standards, Modus maximises compatibility with a user’s existing programs and reports.

Results data can be output for use with third-party applications in a range of formats including Excel (CSV), ASCII text, DMIS, XML, or directly to the Microsoft SQL Server database.

Users may also customise the output file to include parameters such as the part serial number.

Trend data can be displayed against a series of parts in a range of SPC charts.

Furthermore, users of the leading Q-DAS SPC package are fully supported with a user-configurable operator’s interface, from which type 1 and 2 studies can be launched.

Renishaw’s CMM retrofit solutions are based around industry standards and established technologies, maximising flexibility for users.

Modus interfaces with Renishaw’s UCC2 universal CMM controller using the I++ DME protocol, which provides a common language for metrology commands.

This leaves UCC2 users free to use other I++ DME-compliant metrology applications in the future, rather than being tied into a single solution.

Modus ensures guaranteed availability of the latest sensor and controller technology advancements from Renishaw.

This will include future sensors for the Revo five-axis measuring head, the first of which will be automated surface finish measurement (available early in 2009).


A world leader in engineering technologies, Renishaw’s core skills in measurement and precision machining serve sectors as diverse as dimensional metrology, spectroscopy, machine calibration, motion control, dentistry and surgical robotics.

A world leader in engineering technologies, Renishaw’s core skills in measurement and precision machining serve sectors as diverse as dimensional metrology, spectroscopy, machine calibration, motion control, dentistry and surgical robotics.

Sensors for co-ordinate measuring machines (CMMs) are an industry standard, from basic touch-trigger probes through to automated stylus and probe changers, motorised indexing probe heads, and revolutionary five-axis measurement systems.

Machine probes for CNC machine tools allow automated tool setting, workpiece set-up, in-cycle gauging and part inspection. Products include laser tool setters, contact tool setters, tool breakage detectors, touch probes and high accuracy inspection probes.

For motion control, Renishaw supplies laser encoders, optical linear encoders, optical angle encoders, optical rotary encoders, magnetic rotary encoders, magnetic chip encoders and magnetic linear encoders.

To analyse the static and dynamic performance of position-critical motion systems, Renishaw’s laser interferometer and environmental compensation system offers a linear measurement accuracy of 0.5 ppm, readings of up to 50 kHz and a linear measurement speed of up to 4 m/s, with a linear resolution of 1nm.

Renishaw’s Raman spectroscopy products exploit the Raman effect to identify and characterise the chemistry and structure of materials. A diverse range of analytical applications include pharmaceutical, forensic science, nanotechnology, biomedical and semiconductors.

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