Infrared crystal film breakthrough

The Tokyo Institute of Technology and Fujitsu Laboratories have developed a technology that enables the propagation of infrared light through an optical crystal film on a silicon substrate.

The technology is a result of collaborative development by the laboratory of Associate Prof. Kasuo Shinosaki of the Tokyo Institute of Technology and Fujitsu Laboratories. It paves the way for compact optical communication devices featuring the integration of silicon large-scale integrated circuits (LSIs) with optical devices such as modulators and switches.

Network applications increasingly demand smaller sizes and lower costs for high-speed large capacity optical communications systems. Currently available optical communications systems are comprised of devices for processing of optical signals, and silicon LSI devices for processing electrical signals, which are manufactured and assembled separately. The realisation of a compact optical transmission device in which the two separate types of devices are integrated would enable further downscaling and lower costs for optical communication systems.