TEBAL carves out nano niche

Physicists at the

are using a new technique to craft some of the smallest metal nanostructures ever created, none larger than 10nm.

The technique employs transmission electron beam ablation lithography (TEBAL) to ‘carve’ nanostructures from thin sheets of gold, silver, aluminium and other metals. TEBAL is said to provide a more dependable method for producing quality versions of these microscopic devices, which are studied for their novel mechanical properties and their potential use in next-generation sensors and electronics. The method also permits simultaneous, real-time atomic imaging of the devices as they are made.

Traditional techniques for building nanodevices employ electron beam lithography but also require the use of polymers and chemicals in which the metal is evaporated. Typical results are closer to 50nm in size and rarely as small as 10nm.

Marija Drndiæ, professor of physics at Penn, and her team created nanodisks, nanorings, nanowires, nanoholes and multi-terminal nano-transistors.

‘Many different approaches have been undertaken to fabricate the small structures needed to probe the phenomena that take place at the nanoscale, but the most widely used and versatile techniques are limited to tens of nanometres,’ Drndiæ said. ‘Reliably and consistently fabricating devices at the sub-10nm scale from the top down is generally still challenging, but our technique offers a route to this regime.’