Surface roughness is one of the most important quality parameters for wafer materials in industry and science. Atomic force microscopy is a perfect method to evaluate surface roughness with high precision.
An optimized measurement workflow for wafer handling, batch measurement and data evaluation enables analysis on nano-scale with high efficiency.
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CCC Report Finds UK Climate Targets Still Within Reach
In 1990 67% of the UK´s electricity came from coal-fired power stations and even without renewables the transition to gas was a major contributor to...